EPR and TSCR Investigations of Implanted Al-SiO2-Si Systems Treated with RF Plasma Discharge

V.E. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine

National Academy of Sciences of Ukraine

V. S. Lysenko, A. N. Nazarov, S. A. Valiev, I. M. Zaritskii, T. E. Rudenko, and A. S. Tkachenko, phys. stat. sol. (a) vol.113, pp.653-665 (1989)

Nav view search