Low-temperature conductance measurements of surface states in HfO2–Si structures with different gate materials

V. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine

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Y. Gomeniuk, A. Nazarov, Ya. Vovk, Yi Lu, O. Buiu, S. Hall, J.K. Efavi, M.C. Lemme, Materials Science in Semiconductor Processing, vol. 9, pp. 980–984 (2006)

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