EPR and TSCR Investigations of Implanted Al-SiO2-Si Systems Treated with RF Plasma Discharge

V.E. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine

National Academy of Sciences of Ukraine

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V. S. Lysenko, A. N. Nazarov, S. A. Valiev, I. M. Zaritskii, T. E. Rudenko, and A. S. Tkachenko, phys. stat. sol. (a) vol.113, pp.653-665 (1989)