The content of Si-SiO2 layers with high excess Si content preparated by magnetron sputtering

V. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine

M. Baran, B. Bulakh, Ye. Venger, N. Korsunska, L. Khomenkova, T. Stara // Thin Solid Films, v.517, p.5468-5473 (2009)

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