Thermal stability of high-k Si-rich HfO2 layers grown by RF magnetron sputtering

V. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine

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L. Khomenkova, X. Portier, J. Cardin, F. Gourbilleau // Nanotechnology.-2010.-V. 21.-P. 285707 (9 pages).

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