Mechanism of nitrogen incorporation in the amorphous carbon films for different method of deposition

V. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine

Search

You are here: Home

Research divisions

Publications

dep11

dep-11-before

Mechanism of nitrogen incorporation in the amorphous carbon films for different method of deposition

Details: Hits: 5783

A.V. Vasin, R.Yu. Holiney, L.A. Matveeva, V.G. Vysotsky // Proceedings of 4^th International Symposium on Diamond Films and Related Materials, Kharkov, c.167-170 (1999)

Search

Nav view search

Navigation