The peculiarities of structural and optical properties of HfO2-based films co-doped with silicon and erbium

V. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine

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Khomenkova L., Korsunska N., Labbé C., Portier X., Gourbilleau F. Applied Surface Science – 2019 – V. 471 – P.521-527 DOI: https://doi.org/10.1016/j.apsusc.2018.11.251