Atomic scale microstructures of high-k HfSiO thin films fabricated by magnetron sputtering

V.E. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine

National Academy of Sciences of Ukraine

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E. Talbot, M. Roussel, L. Khomenkova, F. Gourbilleau, P. Pareige // Mater.Sci.Eng.B.-2012.-V. 177.-P. 717-720.